Semiconductor Vacuum Components
Precision vacuum chamber components, gas delivery system parts, and wafer handling equipment manufactured from titanium for semiconductor fabrication.
Titanium is increasingly specified for semiconductor manufacturing equipment due to its vacuum compatibility, non-magnetic properties, and resistance to reactive process gases.
Typical Components
- Vacuum Chambers — Process chamber walls and lids
- Gas Distribution Components — Showerheads, injectors, nozzles
- Wafer Handling Parts — End effectors, grippers, paddles
- RF Electrodes — Plasma-facing components
- Fasteners & Hardware — Non-magnetic, corrosion-resistant fasteners
Material Grades
| Grade | Application |
|---|---|
| CP-Ti Grade 2 | Non-structural vacuum components |
| Ti-6Al-4V (Grade 5) | Structural components requiring strength |
Key Requirements
- Ultra-high vacuum (UHV) compatibility
- Non-magnetic properties (< 1.05 relative permeability)
- Surface finish Ra < 0.4 µm for particle control
- Precision tolerances ±0.025 mm typical